Electrochemical, Structural, and optical properties of Tin oxide thin films

Type : Article de conférence
Auteur(s) :  D. Lakhdari, D.Belfenqche, M.C.Benachour, H.DEHDOUH
Année :  2017
Domaine : Sciences des matériaux
Conférence: 5 ème conférence internationale des énergies renouvelables
Résumé en PDF :  (résumé en pdf)
Fulltext en PDF :  (.pdf)
Mots clés :  Thin films, SnO2, XRD

Résumé : 

ABSTRACT SnO2 thin films were electrodeposited on fluorine tin oxide substrate in nitric acid solution. The potential was swept from -0.4 to -1.6V with a rate of 50 mV/s. The films were found uniform, adherent to the substrate and amorphous. The XRD patterns reveal that after heat treatment at 500 °C for 1h, the films turn out to be crystalline in nature. Indeed, the film becomes composed of SnO2 nanocrystallite with a casseterite tetragonal structure. The nanocrystallite size is about 50 nm. The films thickness was found to be approximately 592nm and 563 nm for asdeposited and heat-treated SnO2 thin films, respectively. Some optical parameters of these films such as refractive index (n), extinction coefficient (k), absorption coefficient (α) and band gap were studied.