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TiO2 films deposited by RF Magnetron Sputtering:Gas sensor application

Auteurs : H. MERABET, H. MERADI, L. Alimi, L. Bahloul, T. BAHI, I. Rahmani
Année : 2016
Domaine : Electronique
Type : Communication
Conférence: 4th International Conference on Control Engineering & Information Technology (CEIT-2016)
Résumé en PDF : (résumé en pdf)
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Mots clés : Thin films, sputtering, semiconductor, TiO2 films, gas sensors, carbon dioxide.

Résumé :

The Carbon dioxide (CO2) is a greenhouse gas, hence, its increase contributes to global warming. Titanium dioxide (TiO2) emerging as important material for use in gas sensors. . In this paper, TiO2 thin films was prepared by RF-DC magnetron sputtering on to glass substrates, under argon and oxygen atmosphere. In the aim to prepare TiO2 film which were applied in the gas detection sensor of carbon dioxide, various parameters such as working pressure (50mTorr, 100mTorr, and 150mTorr), flow of Ar and O2 and also substrate temperature have been considered.