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Electrochemical, Structural, and Optical Properties of SnO2 thin films

Auteurs : D.Lakhdari, O.Belgherbi, L.Lamiri, M.Hamissi
Année : 2016
Domaine : Chimie
Type : Communication
Conférence: 1ère Congrès International de l’Environnement, biodiversité et développement Durable CIEBDD’2016
Résumé en PDF : (résumé en pdf)
Fulltext en PDF : (.pdf)
Mots clés : Thin films, optical properties, band gap, electrodeposition, cyclic voltammetry, KOH, KI, LiClO4

Résumé :

SnO2 thin films were electrodeposited on fluorine tin oxide substrate in nitric acid solution. The potential was swept from -0.4 to -1.6V with a rate of 50 mV/s. The films were found uniform, adherent to the substrate and amorphous. The XRD patterns reveal that after heat treatment at 600°C for 1h, the films turn out to be crystalline in nature. Indeed, the film becomes composed of SnO2 nanocrystallite with a casseterite tetragonal structure. The nanocrystallite size is about 50 nm. The films thickness was found to be approximately 592nm and 563 nm for as-deposited and heat-treated (600°C) SnO2 thin films, respectively. Some optical parameters of these films such as refractive index (n), extinction coefficient (k), absorption coefficient (α) and band gap were studied. Theses parameters were deduced by Swanepoel method in the wavelength range 300-800 nm using optical transmission data. It is shown that the band gap was found to increase from 4 eV to 4.036 eV after heat treatment at 600°C.Electrochemical results obtained in aqueous medium: KOH, KI, LiClO4 and H2SO4, shows a good electrochemical stability of these oxides and the curves of electrochemical analysis make it possible to have an outline on the kinetics of the formation of these layers.